The electrostaticDeposition is a boundary condition to calculate electric potential (V) on a given boundary based on film thickness (h) and film resistance (R) fields which are updated based on a given patch-normal current density field (jn), Coulombic efficiency and film resistivity.
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#include <electrostaticDepositionFvPatchScalarField.H>


Public Member Functions | |
| TypeName ("electrostaticDeposition") | |
| Runtime type information. | |
| electrostaticDepositionFvPatchScalarField (const fvPatch &, const DimensionedField< scalar, volMesh > &) | |
| Construct from patch and internal field. | |
| electrostaticDepositionFvPatchScalarField (const fvPatch &, const DimensionedField< scalar, volMesh > &, const dictionary &) | |
| Construct from patch, internal field and dictionary. | |
| electrostaticDepositionFvPatchScalarField (const electrostaticDepositionFvPatchScalarField &, const fvPatch &, const DimensionedField< scalar, volMesh > &, const fvPatchFieldMapper &) | |
| Construct by mapping given electrostaticDepositionFvPatchScalarField onto a new patch. | |
| electrostaticDepositionFvPatchScalarField (const electrostaticDepositionFvPatchScalarField &) | |
| Construct as copy. | |
| electrostaticDepositionFvPatchScalarField (const electrostaticDepositionFvPatchScalarField &, const DimensionedField< scalar, volMesh > &) | |
| Construct as copy setting internal field reference. | |
| virtual tmp< fvPatchField< scalar > > | clone () const |
| Return a clone. | |
| virtual tmp< fvPatchField< scalar > > | clone (const DimensionedField< scalar, volMesh > &iF) const |
| Clone with an internal field reference. | |
| const scalarField & | h () const noexcept |
| Return const access to film thickness patch field. | |
| virtual void | autoMap (const fvPatchFieldMapper &) |
| Map (and resize as needed) from self given a mapping object. | |
| virtual void | rmap (const fvPatchScalarField &, const labelList &) |
| Reverse map the given fvPatchField onto this fvPatchField. | |
| tmp< scalarField > | sigma () const |
| Return the isotropic electrical conductivity field of mixture. | |
| virtual void | updateCoeffs () |
| Update the coefficients associated with the patch field. | |
| virtual void | write (Ostream &) const |
| Write. | |
The electrostaticDeposition is a boundary condition to calculate electric potential (V) on a given boundary based on film thickness (h) and film resistance (R) fields which are updated based on a given patch-normal current density field (jn), Coulombic efficiency and film resistivity.
![\[ j_n = - \sigma \nabla^\perp_p V = - \sigma (\vec{n}\cdot(\nabla V)_p)
\]](form_121.png)
![\[ \frac{dh}{dt} = C_{eff} (j_n - j_{min})
\]](form_122.png)
![\[ \frac{dR}{dt} = \rho \frac{dh}{dt} = \rho C_{eff} (j_n - j_{min})
\]](form_123.png)
![\[ V_{film}^n = V_{film}^o + j_n R_\Delta
\]](form_124.png)
![\[ V_{body} = j_n R_{body}
\]](form_125.png)
![\[ V_p^n = V_i + V_{body} + V_{film}^n
\]](form_126.png)
where
![]() | = | Patch-normal current density [A/m^2] |
![]() | = | Electric potential on film-fluid interface [volt = kg m^2/(A s^3)] |
![]() | = | Previous time-step electric potential on the interface [volt] |
![]() | = | Electric potential due to film resistance [volt] |
![]() | = | Electric potential due to body resistance [volt] |
![]() | = | Initial electric potential [volt] |
![]() | = | Film resistance (finite increment) [ohm m^2 = kg m^4/(A^2 s^3)] |
![]() | = | Body resistance [ohm m^2 = kg m^4/(A^2 s^3)] |
![]() | = | Isotropic film resistivity [ohm m = kg m^3/(A^2 s^3)] |
![]() | = | Film thickness [m] |
![]() | = | Volumetric Coulombic efficiency [m^3/(A s)] |
![]() | = | Minimum current density for deposition onset [A/m^2] |
![]() | = | Isotropic conductivity of mixture [S/m = A^2 s^3/(kg m^3)] |
![]() | = | Patch-normal unit vector [-] |
<patchName>
{
// Mandatory entries
type electrostaticDeposition;
h <scalarField>;
CoulombicEfficiency <PatchFunction1>;
resistivity <PatchFunction1>;
// Conditional mandatory entries
// Option-1: single-phase
sigma <scalar>;
// Option-2: multiphase
phases
{
alpha.air
{
sigma <scalar>;
}
alpha.water
{
sigma <scalar>;
}
alpha.mercury
{
sigma <scalar>;
}
...
}
// Optional entries
jMin <scalar>;
qMin <scalar>;
Rbody <scalar>;
Vi <scalar>;
Vanode <scalar>;
qCumulative <scalarField>;
// Inherited entries
...
}
where the entries mean:
| Property | Description | Type | Reqd | Deflt |
|---|---|---|---|---|
type | Type name: electrostaticDeposition | word | yes | - |
h | Film thickness | scalarField | yes | - |
CoulombicEfficiency | Coulombic efficiency | PatchFunction1<scalar> | yes | - |
resistivity | Isotropic film resistivity | PatchFunction1<scalar> | yes | - |
sigma | Isotropic electrical conductivity of phase | scalar | yes | - |
jMin | Minimum current density for deposition onset | scalar | no | 0 |
qMin | Minimum accumulative specific charge for deposition onset | scalar | no | 0 |
Rbody | Resistance due to main body and/or pretreatment layers | scalar | no | 0 |
Vi | Initial electric potential | scalar | no | 0 |
Vanode | Anode electric potential | scalar | no | GREAT |
qCumulative | Accumulative specific charge [A s/m^2] | scalarField | no | 0 |
The inherited entries are elaborated in:
qCumulative) is less than minimum accumulative specific charge (qMin), no deposition occurs.resistivity, jMin, qMin and Rbody are always non-negative.Definition at line 315 of file electrostaticDepositionFvPatchScalarField.H.
| electrostaticDepositionFvPatchScalarField | ( | const fvPatch & | p, |
| const DimensionedField< scalar, volMesh > & | iF ) |
Construct from patch and internal field.
Definition at line 132 of file electrostaticDepositionFvPatchScalarField.C.
References Foam::dimCurrent, Foam::dimLength, Foam::dimMass, Foam::dimTime, p, Foam::pow3(), and Foam::sqr().
Referenced by electrostaticDepositionFvPatchScalarField(), electrostaticDepositionFvPatchScalarField(), electrostaticDepositionFvPatchScalarField(), and TypeName().


| electrostaticDepositionFvPatchScalarField | ( | const fvPatch & | p, |
| const DimensionedField< scalar, volMesh > & | iF, | ||
| const dictionary & | dict ) |
Construct from patch, internal field and dictionary.
Definition at line 160 of file electrostaticDepositionFvPatchScalarField.C.
References dict, Foam::dimCurrent, Foam::dimLength, Foam::dimMass, Foam::dimTime, forAll, Foam::New(), p, Foam::pow3(), and Foam::sqr().

| electrostaticDepositionFvPatchScalarField | ( | const electrostaticDepositionFvPatchScalarField & | ptf, |
| const fvPatch & | p, | ||
| const DimensionedField< scalar, volMesh > & | iF, | ||
| const fvPatchFieldMapper & | mapper ) |
Construct by mapping given electrostaticDepositionFvPatchScalarField onto a new patch.
Definition at line 259 of file electrostaticDepositionFvPatchScalarField.C.
References clone(), electrostaticDepositionFvPatchScalarField(), and p.

| electrostaticDepositionFvPatchScalarField | ( | const electrostaticDepositionFvPatchScalarField & | ptf | ) |
Construct as copy.
Definition at line 289 of file electrostaticDepositionFvPatchScalarField.C.
References clone(), and electrostaticDepositionFvPatchScalarField().

| electrostaticDepositionFvPatchScalarField | ( | const electrostaticDepositionFvPatchScalarField & | ptf, |
| const DimensionedField< scalar, volMesh > & | iF ) |
Construct as copy setting internal field reference.
Definition at line 316 of file electrostaticDepositionFvPatchScalarField.C.
References clone(), and electrostaticDepositionFvPatchScalarField().

| TypeName | ( | "electrostaticDeposition" | ) |
Runtime type information.
References electrostaticDepositionFvPatchScalarField().

|
inlinevirtual |
Return a clone.
Definition at line 504 of file electrostaticDepositionFvPatchScalarField.H.
References fvPatchField< Type >::Clone().
Referenced by electrostaticDepositionFvPatchScalarField(), electrostaticDepositionFvPatchScalarField(), and electrostaticDepositionFvPatchScalarField().


|
inlinevirtual |
Clone with an internal field reference.
Definition at line 512 of file electrostaticDepositionFvPatchScalarField.H.
References fvPatchField< Type >::Clone().

|
inlinenoexcept |
Return const access to film thickness patch field.
Definition at line 528 of file electrostaticDepositionFvPatchScalarField.H.
References Foam::noexcept.
|
virtual |
Map (and resize as needed) from self given a mapping object.
Definition at line 346 of file electrostaticDepositionFvPatchScalarField.C.
|
virtual |
Reverse map the given fvPatchField onto this fvPatchField.
Definition at line 369 of file electrostaticDepositionFvPatchScalarField.C.
References Foam::refCast().

| Foam::tmp< Foam::scalarField > sigma | ( | ) | const |
Return the isotropic electrical conductivity field of mixture.
Definition at line 397 of file electrostaticDepositionFvPatchScalarField.C.
References tmp< T >::New(), and tmp< T >::ref().

|
virtual |
Update the coefficients associated with the patch field.
Definition at line 419 of file electrostaticDepositionFvPatchScalarField.C.
References Foam::endl(), forAll, Foam::gAverage(), Foam::gMinMax(), Foam::Info, limits, UPstream::master(), Foam::max(), Foam::min(), Foam::nl, Foam::operator==(), tmp< T >::ref(), sigma(), and timeIndex.

|
virtual |
Write.
Definition at line 519 of file electrostaticDepositionFvPatchScalarField.C.
References os(), fvPatchField< Type >::write(), and fvPatchField< Type >::writeValueEntry().
